Mask Configuration (dmcom0120s000)

Use this session to define and modify the mask configurations.

Mask consists of one or more concatenated mask template segments. For each segment, you must select one of these types:

  • Fixed
  • Generated
  • Reference Variable
  • System Variable

Specify the segment values:

  • For a fixed segment, you must specify a value, for example, DOC-.
  • For a generated segment, you must specify a value that contains generated characters, such as a pound sign (#) that represents a digit, and an asterisk (*) that represents a letter.
  • For a reference variable segment, click the browse arrow to select the required variable from the Table Fields (ttadv4529m000) session.
  • For a system variable segment, click the browse arrow to select the required variable from the System Parameters (dmcom0125m000) session.

To implement a major and a minor revision mechanism for a revision field, you must specify at least two generated segments in the mask. This enables you to select the mask segment to be incremented.

Example

If a mask is defined with a fixed segment REV- and generated segments (##) and (-*), these results are generated:

  • The initial value is REV-00-A
  • The next major revision is REV-01-A
  • The next minor revision is REV-01-B
Note: The field configuration for a mask configuration depends on the value of another field. The other field that is labeled with this field name appears above the Mask Template Segments list. You must specify the field value to which this mask configuration applies.

Field Information

Object

The object ID that acts as an identifier.

Object Description

The object name.

Mask Code

The object mask code.

Remarks

The remarks on mask code. If this check box is selected, the remarks appear.

Active

The active status of mask code. If this check box is selected, the status is active. Otherwise, the status is inactive.

Mask Depend On

The object attribute of the main table of the object on which the object mask depends. This attribute displays the Mask Depend On ID. This value is picked from the Object Masks (dmcom0122s000) session.

Mask Depend On

The Mask Depend On name.

Value Depend On

The object attribute of the main table of the object on which the value of object mask depends. This field displays the Value Depend On ID, which is picked from the Object Masks (dmdomc0122s000) session.

Value Depend On

The Value Depend On name.

Description

The object type for which the mask configuration is to be used.

Example: Document Type

Type

Select the mask template segment type.

Value

The value for either a fixed format segment or a generated format segment.

Note: The fixed format segments are the static identifiers of the mask configuration, such as DOC, HCOPY, FLDR. The generated format segments are the sections of the identifier that can be incremented. You must use the number sign (#) to represent a digit, and an asterisk (*) to represent a letter.
Separator

The value of the separator to separate various segments of the mask configuration. The separator can be characters such as a hyphen, backslash, and so on.

Description

The description of the segment.

System Variable

The predefined variable for ERP, such as logname$, utc.num() and so on. If a user selects the logname$ to create a mask configuration, the value is reflected in the mask code, which is generated for the object.

Note: If the user selects logname$ as system variable for the mask configuration of the object - attribute (ATTR-logname$-####), then the value generated for the attribute is ATTR-userlogin-0001.
Reference Variable

One of the fields of objects main table. The mask configuration defined using the reference variable contains the value of the field as reference.

Note: If the mask configuration for CR has a reference variable as CR Status (field name - crst), the mask code for the object is CR-created-0001.
Mask

The complete mask configuration.

Date of Creation

The date and time at which the mask was configured.

Date of Modification

The most recent date and time of modification for the configured mask.

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